Preparation of Titanium Nitride Thin Films by Using Coaxial Magnetron Plasmas with Multi Hollow Cathodes

摘要

In order to prepare a protective thin film on inner wall of a metallic pipe with a small diameter, we developed a new coating method by using coaxial magnetron plasmas with multi hollow cathodes. In this method, in addition to the magnetron effect, hollow cathode discharge was realized to get high current density for lower pressure condition than that of a conventional coaxial magnetron plasma source. By using this plasma source, trial preparation of titanium nitride thin films on inner wall of a metallic pipe has been successfully performed at high deposition rate, ～100 [Å/sec] .