首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >XPS characterization of the corrosion film formed on the electroless nickel deposit prepared using different stabilizers in NaCl solution
【24h】

XPS characterization of the corrosion film formed on the electroless nickel deposit prepared using different stabilizers in NaCl solution

机译:用化学稳定剂在氯化钠溶液中制备的化学镀镍层上形成的腐蚀膜的XPS表征

获取原文
获取原文并翻译 | 示例
           

摘要

X-ray photoelectron spectroscopy (XPS) was used to examine the corrosion films formed on electroless nickel (EN) deposits prepared in an EN solution containing two different types and concentrations of bath stabilizers in Ar-purged and oxygenated neutral 5% NaCl solution. Two distinctive corrosion films were observed after long periods of immersion. An enrichment of elemental phosphorus compared to nickel was observed on the surface of the EN deposit produced with no stabilizer and with maleic acid (MA). By comparison, a high degree of surface oxidation was observed on the EN deposit prepared with thiourea. Trace impurities of sulfur in the EN deposit prepared with thiourea appear to result in enhanced corrosion and, in turn, lead to the build-up of corrosion products on the EN surface. By contrast, a P-enriched chemical passivation layer was formed on the EN deposits prepared either without any stabilizer or with MA present. Copyright (c) 2007 Crown in the right of Canada, and John Wiley & Sons, Ltd.
机译:X射线光电子能谱(XPS)用于检查在化学溶液中制备的腐蚀膜,该化学溶液是在含两种不同类型和浓度的Ar净化和氧吹扫的中性5%NaCl溶液的EN溶液中制备的化学镍(EN)沉积物上形成的。长时间浸泡后观察到两个独特的腐蚀膜。在没有稳定剂和马来酸(MA)的情况下,在EN沉积物的表面观察到元素磷比镍富集。通过比较,在用硫脲制备的EN沉积物上观察到高度的表面氧化。用硫脲制备的EN沉积物中的痕量硫杂质似乎会导致腐蚀增强,进而导致EN表面上积聚腐蚀产物。相比之下,在没有任何稳定剂或存在MA的情况下制备的EN沉积物上形成了富P的化学钝化层。版权所有(c)2007 Crown在加拿大和John Wiley&Sons,Ltd.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号