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Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source

机译:磁控溅射型负离子源制备的DLC膜的拉曼和XPS研究

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摘要

The characteristics of diamond-like carbon (DLC) films deposited on a 4-in. Si (100) substrate using a magnetron sputter-type negative ion source (MSNIS) were investigated using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) method. In the MSNIS source, a negative ion beam is generated by a cesium-induced sputter-type secondary negative ion emission process. DLC films deposited using this MSNIS technique were compared with films prepared using a conventional magnetron sputter process under various deposition conditions. Since the final energy of the negative ion arriving at the substrate is a function of the cathode voltage, the cathode voltage dependence of the film properties was investigated. As the applied voltage is increased, the more diamond-like properties were observed. Overall results suggest that the sp(3) bonding of DLC film can be effectively controlled using a MSNIS. (c) 2004 Elsevier B.V All rights reserved.
机译:沉积在4-in上的类金刚石碳(DLC)膜的特性。使用磁控溅射型负离子源(MSNIS)的Si(100)衬底通过拉曼光谱和X射线光电子能谱(XPS)方法进行了研究。在MSNIS源中,通过铯诱导的溅射型二次负离子发射过程产生负离子束。将使用该MSNIS技术沉积的DLC膜与在各种沉积条件下使用常规磁控溅射工艺制备的膜进行了比较。由于到达基板的负离子的最终能量是阴极电压的函数,因此研究了阴极电压对薄膜性能的依赖性。随着施加电压的增加,观察到更多的类金刚石性质。总体结果表明,可以使用MSNIS有效控制DLC膜的sp(3)键。 (c)2004 Elsevier B.V保留所有权利。

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