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Enhanced field emission of silicon tips coated with sol-gel-derived (Ba0.65Sr0.35)TiO3 thin film

机译:溶胶-凝胶衍生的(Ba0.65Sr0.35)TiO3薄膜包覆的硅棒的场发射增强

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Enhanced field emission of silicon emitter arrays coated with (Ba0.65Sr0.35)TiO3 (BST) thin film has been investigated by varying annealing temperature and thickness of sol-gel BST coatings. The results indicate that the BST coatings exhibit the perovskite structure while annealed between 650 and 700 degrees C, and an interfacial reaction occurs between silicon and BST coating while annealed above 750 degrees C. The BST-coated silicon tips show considerable improvement in electron emission. The emission behavior is highly correlated to the crystallinity of BST layer, and the turn-on field could be lowered substantially from 38 V/mu m for bare silicon tips to about 12 V/mu m for BST-coated silicon tips annealed at 700 degrees C. The thickness of BST coatings and interface reaction at Si/BST interface also affect the emission behaviors significantly. Analysis of the emission data using Fowler-Nordheim plots suggests that the improvement in electron emission originates from the lowering of work function with BST coatings. (c) 2004 Elsevier B.V All rights reserved.
机译:通过改变退火温度和溶胶-凝胶BST涂层的厚度,研究了涂有(Ba0.65Sr0.35)TiO3(BST)薄膜的硅发射极阵列的增强场发射。结果表明,BST涂层在650至700摄氏度之间退火时表现出钙钛矿结构,而在750摄氏度以上退火时,硅与BST涂层之间发生界面反应。BST涂层的硅棒在电子发射方面显示出显着改善。发射行为与BST层的结晶度高度相关,并且开通电场可以从裸硅尖端的38 V /μm大幅降低到700摄氏度退火的BST涂层硅尖端的约12 V /μm C. BST涂层的厚度和Si / BST界面处的界面反应也会显着影响发射行为。使用Fowler-Nordheim曲线对发射数据进行的分析表明,电子发射的改善源自BST涂层功函数的降低。 (c)2004 Elsevier B.V保留所有权利。

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