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Low- and high-energy plasma immersion ion implantation for modification of material surfaces

机译:低能和高能等离子体浸没离子注入,用于材料表面改性

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Low- and high-energy plasma immersion ion implantation (Pill) of nitrogen has been performed on austenitic stainless steel and high-carbon low-alloy steel to modify their surface properties. In the case of austenitic stainless steel, an expanded austenite layer with surface microhardness of 650 HV was formed with a thickness of 7-8 mum for an elevated treatment temperature of 400 degreesC, irrespective of the treatment energy. X-Ray photoelectron spectroscopy (XPS) investigations revealed that, at high energy, nitrogen is in a bound state and chromium nitride is formed in the subsurface region, followed by expanded austenite. In the case of high-carbon low alloy steel, the diffusion coefficient of nitrogen obtained by Pill is higher than that obtained by glow-discharge plasma nitriding. The results indicate that if implantation is followed by diffusion, low-energy Pill gives similar or better results than high-energy PIII as far as the treated layer thickness, phase formation and microhardness are considered. Low-energy PHI has a lower hardware cost and reduced sheath dimensions, and thus uniformity in surface modification is achieved. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 20]
机译:在奥氏体不锈钢和高碳低合金钢上进行了氮的低能和高能等离子体浸没离子注入(Pill),以改变它们的表面性能。在奥氏体不锈钢的情况下,不管处理能量如何,以400℃的升高的处理温度形成具有650HV的表面显微硬度的膨胀奥氏体层,其厚度为7-8μm。 X射线光电子能谱(XPS)研究表明,在高能量下,氮处于键合状态,并且在次表层区域形成氮化铬,然后膨胀奥氏体。在高碳低合金钢的情况下,通过Pill获得的氮的扩散系数高于通过辉光放电等离子体氮化获得的氮的扩散系数。结果表明,如果在注入之后进行扩散,则在考虑处理层的厚度,相形成和显微硬度方面,低能药丸的效果与高能药丸III相似或更好。低能量PHI具有较低的硬件成本和减小的护套尺寸,因此实现了表面改性的均匀性。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:20]

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