Effect of ion implantation layer on adhesion of DLC film by plasma-based ion implantation and deposition

摘要

High adhesive diamond-like carbon (DLC) film on SUS304 was obtained using carbon ion implantation between DLC film and substrate material by plasma-based ion implantation and deposition (PBIID). Implantation of mixed silicon and carbon ions to the substrate resulted in much higher adhesion strength than that of the epoxy resin. Effect of ion implantation on adhesion of DLC film was studied by cross sectional STEM observation and EDS element analysis. Enhancement in adhesive strength by ion implantation of mixed carbon and silicon was ascribed to the formation of the multilayer interface consisting of mixed carbon and silicon ion implanted layer and the amorphous layer of carbon and silicon. (c) 2006 Elsevier B.V. All rights reserved.