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Growth of zinc oxide films and nanowires by atmospheric-pressure chemical vapor deposition using zinc powder and water as source materials

机译:以锌粉和水为原料的大气压化学气相沉积法生长氧化锌膜和纳米线

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Highly oriented ZnO films have been grown on c-plane sapphire substrate by atmospheric-pressure chemical vapor deposition using Zn powder and H2O as source materials, Photoluminescence intensity ratio of the green band at similar to 2.5 eV to the near-band-edge emission at similar to 3.2 eV (I-GB/I-NBE) decreased with increasing the source feeding ratio of H2O to Zn (VI/II), indicating the possibility of the defect control. The absorption edge of the photoacoustic spectrum shifted towards lower energies and the resistivity decreased with increasing VI/II ratio. These tendencies are related to the incorporated H atom, the existence of which was confirmed by Raman, infrared absorption and attenuated total reflection measurements. Nanowires (NWs) of ZnO were successfully grown on the SiO2/Si(100) substrate coated with the An nanoparticle solution or the solution for enhanced metalorganic decomposition for NiO film. The diameters of NWs grown by the former and the latter solutions changed from 50 to 250 nm and from 60 to 700 nm depending on substrate temperature and concentration of the solution, respectively. Several NWs grown on the patterned Si substrate with line-and-space pattern bridged between the mesas. Moreover, suspended NWs were grown between the Si cylindrical pillars. These results demonstrate the possibility of self-assembling nano-interconnection. (c) 2007 Elsevier B.V. All rights reserved.
机译:通过使用Zn粉和H2O作为原料的大气压化学气相沉积法,在c面蓝宝石衬底上生长了高度取向的ZnO薄膜,绿色带的光致发光强度比与2.5 eV的近带边缘发射率相近。随着H2O与Zn的源进料比(VI / II)的增加,类似于3.2 eV(I-GB / I-NBE)的值降低,这表明有可能进行缺陷控制。随着VI / II比值的增加,光声光谱的吸收边缘移向较低的能量,电阻率降低。这些趋势与掺入的氢原子有关,氢原子的存在已通过拉曼,红外吸收和衰减的全反射测量得到证实。 ZnO纳米线(NWs)成功地生长在涂有纳米颗粒溶液或NiO膜增强金属有机分解溶液的SiO2 / Si(100)衬底上。由前一种溶液和后一种溶液生长的NW的直径分别从50nm至250nm和从60nm至700nm变化,这分别取决于底物温度和溶液的浓度。几个NW在图案化的Si衬底上生长,并且在台面之间桥接了线和间隔的图案。此外,悬浮的NW在Si圆柱柱之间生长。这些结果证明了自组装纳米互连的可能性。 (c)2007 Elsevier B.V.保留所有权利。

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