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Preparation and characterization of semiconductor GNR-CNT nanocomposite and its application in FET

机译:半导体GNR-CNT纳米复合材料的制备,表征及其在FET中的应用

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So far, little is known about the experimental potential of graphene nanoribbon-carbon nanotube (GNR-CNT) heterostructure as a semiconductor nanocomposite. The present work examined the structural features, topography and electronic properties of GNR-CNT nanocomposite by using Raman spectroscopy, transmission electron microscopy, scanning tunneling microscopy and spectroscopy (STS). The homogenous semiconductor GNR-CNT nanocomposites were produced under optimized synthesis conditions. The narrow band gap was exhibited by optimization of the reduction step. The STS of the micro-scale surface of the nanocomposite shows local density of state in selected areas that represent the 0.08 eV band gap of a homogenous nanocomposite. The potential of the semiconductor nanocomposite was considered for application in stacked graphene nanoribbon-field effect transistors (SGNR-FETs). A simple method of device fabrication is proposed based on a semiconductor stacked GNR nanocomposite. The high hole mobility and rectifying effect of the p-n junction of the SGNR nanocomposite on TiO2 are demonstrated. The optimal thickness for the back gate TiO2 dielectric for the tested devices was 40 nm. This thickness decreased leakage current at the p-n junction of the SGNR/TiO2 interface, which is promising heterojunction for optoelectronics. The thickness of gate dielectric and quantum capacitance of the gate was investigated at the low 40 nm thickness by calculating the mobility. In the proposed SGNR-FET, holes dominate electrical transport with a high mobility of about 1030 cm(2)/V s. (C) 2016 Elsevier Ltd. All rights reserved.
机译:到目前为止,关于石墨烯纳米带-碳纳米管(GNR-CNT)异质结构作为半导体纳米复合材料的实验潜力还知之甚少。本工作通过使用拉曼光谱,透射电子显微镜,扫描隧道显微镜和光谱法(STS)研究了GNR-CNT纳米复合材料的结构特征,形貌和电子性能。在优化的合成条件下生产出均质的半导体GNR-CNT纳米复合材料。通过还原步骤的优化显示出窄带隙。纳米复合材料的微尺度表面的STS在所选区域中显示局部状态密度,其代表均质纳米复合材料的0.08eV带隙。考虑将半导体纳米复合材料的潜力用于堆叠的石墨烯纳米带场效应晶体管(SGNR-FET)。提出了一种基于半导体堆叠式GNR纳米复合材料的简单器件制造方法。证明了SGNR纳米复合材料的p-n结在TiO2上的高空穴迁移率和整流作用。对于被测器件,背栅TiO2电介质的最佳厚度为40 nm。这种厚度减小了SGNR / TiO2界面的p-n结处的泄漏电流,这对于光电子学来说是有希望的异质结。通过计算迁移率,在低40 nm厚度下研究了栅极电介质的厚度和栅极的量子电容。在提出的SGNR-FET中,空穴以约1030 cm(2)/ V s的高迁移率主导电传输。 (C)2016 Elsevier Ltd.保留所有权利。

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