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首页> 外文期刊>The journal of physics and chemistry of solids >Sources of carrier compensation in arsenic-doped HgCdTe
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Sources of carrier compensation in arsenic-doped HgCdTe

机译:砷掺杂的HgCdTe中载流子补偿的来源

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Using first-principles methods, we have investigated structural and electronic properties of substitutional arsenic donor (As _(Hg)), mercury vacancies (V _(Hg)), and their complexes in arsenic doping of HgCdTe. The role of V Hg in arsenic activation has also been discussed. Counterintuitively, we find that As _(Hg) and V _(Hg) is a single donor and a single acceptor, respectively. The unpaired electron of As _(Hg) makes it act as a nucleation center, driving arsenic interstitials into clusters, which is predicted as a potential candidate for arsenic deactivation. V _(Hg), exhibiting comparable formation energy with the As _(Hg) donor as well as a shallow acceptor level, is a dominant compensating acceptor in as-grown materials. Coulomb interaction allows As _(Hg) to bind at most one or two V _(Hg). The resulting complexes behave as compensating acceptors at low temperature. The model outlined for carrier compensation in arsenic-doped HgCdTe contacts well with experimental observations in arsenic activation.
机译:使用第一原理方法,我们研究了砷掺杂HgCdTe中取代砷供体(As _(Hg)),汞空位(V _(Hg))及其配合物的结构和电子性质。还讨论了V Hg在砷活化中的作用。与直觉相反,我们发现As _(Hg)和V _(Hg)分别是单个供体和单个受体。 As _(Hg)的不成对电子使其充当成核中心,将砷间隙驱动成簇,这被预测为砷失活的潜在候选者。 V_(Hg)具有与As _(Hg)供体相当的形成能以及较浅的受体能级,它是生长材料中的主要补偿受体。库仑相互作用允许As _(Hg)最多结合一个或两个V _(Hg)。所得的络合物在低温下表现为补偿受体。概述了砷掺杂的HgCdTe中载流子补偿的模型与砷活化的实验观察结果很好地联系。

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