首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Synthesis of Highly Ordered Mesoporous Silica with a Lamellar Structure Using Assembly of Cationic and Anionic Surfactant Mixtures as a Template
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Synthesis of Highly Ordered Mesoporous Silica with a Lamellar Structure Using Assembly of Cationic and Anionic Surfactant Mixtures as a Template

机译:以阳离子和阴离子表面活性剂混合物为模板合成层状结构的高序介孔二氧化硅

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摘要

Highly ordered lamellar-type mesoporous silica was prepared by using molecular assemblies formed in an aqueous mixture of cationic cetyltrimethylammonium bromide (CTAB) and anionic sodium octylsulfate (SOS) as structure-directing agents. The mesoporous silica prepared at the composition of CTAB:SOS = 7.5:2.5 (in mol ratio) possessed high surface area (S_(BET) = 995 ㎡ g-1) and uniform pore structure (average layer distance = 3.1 nm) with a narrow size distribution. The lamellar molecular assembly was rearranged and pillars between silica layers grew up in it during the aging process with hydrothermal treatment. We emphasize from the present results that it is possible to control the silica interlayer distance precisely in the range of 3.60 and 5.19 nm when changing the mixing ratio of the surfactants.
机译:通过使用在阳离子十六烷基三甲基溴化铵(CTAB)和阴离子辛基硫酸钠(SOS)的水性混合物中形成的分子组件作为结构导向剂,可以制备高度有序的层状中孔二氧化硅。以CTAB:SOS = 7.5:2.5(摩尔比)组成制备的介孔二氧化硅具有高表面积(S_(BET)= 995㎡g-1)和均匀的孔结构(平均层距= 3.1 nm),且具有尺寸分布狭窄。在经过水热处理的时效过程中,层状分子组装被重新排列,并且二氧化硅层之间的柱子在其中生长。我们从目前的结果中强调,当改变表面活性剂的混合比时,可以将二氧化硅层间距离精确地控制在3.60至5.19nm的范围内。

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