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Oxygen adsorption on Si(100)-2 * 1 via trapping-mediated and direct mechanisms

机译:氧通过俘获介导的直接机制吸附在Si(100)-2 * 1上

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We present the results from a molecular beam study of the initial adsorption probability (S_0) of O_2 on Si(100)-2 * 1 as a function of surface temperature, incident kinetic energy and angle. The data show two distinct kinetic energy regimes with opposite temperature and energy dependencies, and correspond to two different adsorption mechanisms. For low incident kinetic energies, a trapping-mediated mechanism is dominant, exhibiting a strong increase in S_0 with decreasing surface temperature and kinetic energy. Also, adsorption at low kinetic energies is independent of incident angle, indicating total energy scaling. Data in this range are well-described by a simple precursor model, which gives a difference in activation barrier heights of (E_d-E_c) = 28 meV, and a ratio of preexponentials v_d/v_c = 24.2. Trapping probabilities can also be estimated from the model, and show a strong falloff with increasing energy, as would be expected. At high incident kinetic energies, a strong increase in S_0 with kinetic energy indicates that a direct chemisorption mechanism is active, with the observed energy scaling proportional to cos #theta#_i. There is also an unusual increase in S_0 with surface temperature, with only a weak increase below 600 K, and a stronger increase above 600 K. The direct mechanism trends are discussed in terms of a possible molecular ion intermediate with thermally activated charge transfer. The molecular beam measurements are also used in calculating the reactivity of a thermalized gas with a clean surface. The precursor model is combined with a two-region fit of the direct adsorption data to predict chemisorption probabilities as a function of the incident conditions. These functions are then weighted by a Maxwell-Boltzmann distribution of incident angles and energies to calculate the adsorption probability for a thermal gas. These calcultions indicate that the predominant mechanism depends strongly on temperature, with trapping-mediated chemisorption accounting for all of the adsorption at low temperatures, and direct adsorption slowly taking over at higher temperatures.
机译:我们提出的分子束研究结果表明,O_2在Si(100)-2 * 1上的初始吸附概率(S_0)与表面温度,入射动能和角度有关。数据显示了两个不同的动能状态,它们具有相反的温度和能量依赖性,并且对应于两个不同的吸附机理。对于低入射动能,俘获介导的机理占主导,随着表面温度和动能的降低,S_0显着增加。同样,低动能下的吸附与入射角无关,表明总能量成比例。这个范围内的数据可以通过简单的前驱模型很好地描述,该模型在激活势垒高度上的差异为(E_d-E_c)= 28 meV,预指数之比v_d / v_c = 24.2。诱捕概率也可以从模型中估算出来,并且可以预料,随着能量的增加,诱捕概率会大大降低。在高入射动能下,S_0随着动能的强烈增加表明直接化学吸附机制是活跃的,观察到的能量成比例与cos#theta#_i成比例。 S_0也随表面温度而异常增加,在600 K以下只有微弱的增加,而在600 K以上只有较强的增加。讨论了直接的机理趋势,涉及具有热活化电荷转移的可能的分子离子中间体。分子束测量还用于计算热化气体与清洁表面的反应性。前驱体模型与直接吸附数据的两个区域拟合相结合,以预测化学吸附概率与入射条件的关系。然后通过入射角和能量的Maxwell-Boltzmann分布对这些函数进行加权,以计算热气体的吸附概率。这些计算表明,主要的机理主要取决于温度,在低温下,捕集介导的化学吸附占所有吸附,而在较高的温度下,直接吸附缓慢地接管。

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