Defect evolution in ultrathin films of polystyrene-block-polymethylmethacrylate diblock copolymers observed by atomic force microscopy

摘要

We track individual defects in the microdomain patterns of cylinder-forming polystyrene-block-polymethylmethacrylate films with atomic force microscopy to elucidate the evolution of diblock domain topology during annealing. This evolution takes place through relinking, joining, clustering, and annihilation of defects. Such processes form the basis for predicting structural change in polymer films. (C) 1998 American Institute of Physics. [S0021-9606(98)71047-5]. [References: 16]