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首页> 外文期刊>The International Journal of Advanced Manufacturing Technology >Ultrafine polishing of optical polymer with zirconia-coated carbonyl-iron-particle-based magnetic compound fluid slurry
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Ultrafine polishing of optical polymer with zirconia-coated carbonyl-iron-particle-based magnetic compound fluid slurry

机译:氧化锆包覆的羰基-铁颗粒基磁性化合物流体浆料对光学聚合物的超细抛光

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摘要

Optoelectronic devices made using precision polymers must be polished to achieve nanolevel surface roughness for proper device operation. One promising novel finishing technique is magnetic compound fluid (MCF) polishing. An MCF is a mixture of magnetic fluid (MF) and magnetorheological (MR) fluid, both of which use the same solvent. Because conventional carbonyl iron particles (CIPs) used in common water-based MCFs lack the ability to prevent aqueous corrosion, zirconia (ZrO2)-coated CIPs are used in MCFs. For ultrafine polishing of polymethylmethacrylate (PMMA), surface roughness values achieved using ZrO2-coated CIP-based MCF slurries of various compositions were investigated. For comparison, the surface roughness values achieved with conventional non-coated CIP (i.e. HQ CIPs by BASF Japan Ltd.)-based MCF slurry and ZrO2-coated CIP-based MR fluid slurry were examined as well. The results are explained in terms of the status of the used MCF slurries and the generated normal forces during polishing. The use of relatively large abrasive particles (alumina (Al2O3)) in the ZrO2-coated CIP-based MCF slurries did not achieve better surface roughness and higher improvement rates than the conventional HQ CIP-based MCF slurry. Better surface roughness and a higher improvement are attained with MCF slurry than MR fluid slurry, because the magnetite particles within the MCF slurry help distribute the abrasive particles uniformly and stiffen magnetic clusters. In the absence of both Al2O3 abrasives and alpha-cellulose, better surface roughness is achieved using ZrO2-coated CIP-based MCF slurry; the best surface roughness of R (a) 0.913 nm is achieved with a CIP concentration of 70 wt.% at a considerable improvement rate. The ZrO2-coated CIP concentration should be less than a certain value (in the current work, 70 wt.%); otherwise, the MCF slurry will show bad particle dispersion ability and be prone to dryness, which will result in the loss of polishing ability.
机译:使用精密聚合物制成的光电器件必须进行抛光,以达到纳米级的表面粗糙度,以确保器件正常运行。一种有前途的新颖精加工技术是磁性复合液(MCF)抛光。 MCF是磁流体(MF)和磁流变(MR)流体的混合物,两者都使用相同的溶剂。由于普通的水性MCF中使用的常规羰基铁颗粒(CIP)缺乏防止水腐蚀的能力,因此在MCF中使用了氧化锆(ZrO2)涂层的CIP。对于聚甲基丙烯酸甲酯(PMMA)的超细抛光,研究了使用各种组成的ZrO2涂层CIP基MCF浆料获得的表面粗糙度值。为了进行比较,还检查了用常规的非涂覆的CIP(即由BASF Japan Ltd.生产的HQ CIPs)基的MCF浆料和ZrO2涂覆的CIP基的MR流体浆料所获得的表面粗糙度值。根据使用的MCF浆料的状态和抛光过程中产生的法向力来解释结果。与传统的基于HQ CIP的MCF浆料相比,在ZrO2涂层的CIP的MCF浆料中使用相对较大的磨料颗粒(氧化铝(Al2O3))无法获得更好的表面粗糙度和更高的改善率。 MCF浆料比MR流体浆料可获得更好的表面粗糙度和更高的改进,因为MCF浆料中的磁铁矿颗粒有助于均匀分布磨料颗粒并增强磁团簇。在没有Al2O3磨料和α-纤维素的情况下,使用ZrO2涂层的CIP基MCF浆料可获得更好的表面粗糙度。 CIP浓度为70 wt。%时,R(a)的最佳表面粗糙度达到了0.913 nm,并且改善率很高。 ZrO2涂层的CIP浓度应小于一定值(在当前工作中为70 wt。%);否则,MCF浆液将显示出较差的颗粒分散能力并易于干燥,这将导致抛光能力下降。

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