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3D analysis of buried interfaces using interference microscopy

机译:使用干涉显微镜对掩埋界面进行3D分析

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The use of white light interference microscopy for the non-destructive 3D measurement of an interface buried under a transparent layer has been investigated. Test samples consisting of step structures (< 2 μm) etched in silicon and then covered by a thick (> 1 mum) layer of resin have been studied. The 3D morphology of the buried step was successfully measured through the transparent layer. Comparison of the step heights measured before and after the deposition of the resin layer shows a reduction in the estimated measurement precision from 4% in air to 9% through the transparent layer. The additional errors arise from optical aberrations due to the roughness and the geometry of the air/resin surface, the thickness of the layer and possibly from inhomogeneities in the refractive index of the layer that contribute to a degradation of the wavefront reflected from the interface.
机译:已经研究了将白光干涉显微镜用于掩埋在透明层下的界面的3D无损测量。已经研究了由在硅中蚀刻的阶梯结构(<2μm)组成,然后被厚(> 1 mum)树脂覆盖的测试样品。通过透明层成功测量了掩埋台阶的3D形态。比较在树脂层沉积之前和之后测量的台阶高度,表明通过透明层将估计的测量精度从空气中的4%降低到9%。额外的误差是由于空气/树脂表面的粗糙度和几何形状,层的厚度以及可能由层的折射率的不均匀性引起的光学像差引起的,该不均匀性导致了从界面反射的波前的劣化。

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