首页> 外文期刊>The European physical journal. Applied physics >Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering
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Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering

机译:磁控溅射在Ti-6Al-4V合金基体上形成TiN / Ti多层膜

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摘要

Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering in Ar gas atmosphere was examined, aiming at the application of the alloy to artificial heart valves, in order to improve not only the adhesion between the deposited film and the alloy but also the surface smoothness of titanium nitride coatings and thereby to improve the blood compatibility as well as the biocompatibility of the alloy coated with the titanium nitride film. The effects of the thickness of the TiN (titanium nitride) layer on the surface morphology of the film were investigated, in order to develop TiN coatings with higher blood compatibility. The multi-layered films were deposited by sputtering in sequence pure titanium and titanium nitride targets. The thickness of titanium nitride layer was varied from 300 nm to 800 nm, while that of pure titanium was constantly 200 nm. Under visual observation, the obtained multi-layered films looked yellow gold and appeared to be uniform and adhesive, while TiN monolithic films deposited directly onto the alloy substrate under the same sputtering conditions peeled off partly. Therefore it was found that the multi-layered thin films were more adhesive to the alloy than the monolithic films. According to AFM (Atomic Force Microscope) images for both of the films, the surface morphology of each TiN layer observed under the scope of nanometer-scaled area was rough with pits and bumps, while that under the scope of micrometer-scaled area was smooth without such pits and bumps. Furthermore based on the AFM, the surface roughness sigma(RMS) measured under the area of nanometer scale was found to increase with the increase of the thickness of the TiN layer in the multi-layered film, although that measured under the area of micrometer scale was assumed to be independent of the thickness of the TiN layer.
机译:研究了在Ar气氛中通过磁控溅射用TiN / Ti多层膜涂覆Ti-6Al-4V合金基体的方法,旨在将该合金应用于人工心脏瓣膜,不仅提高了沉积层之间的附着力膜和合金,还可以改善氮化钛涂层的表面光滑度,从而改善涂有氮化钛膜的合金的血液相容性和生物相容性。为了开发具有更高血液相容性的TiN涂层,研究了TiN(氮化钛)层的厚度对薄膜表面形态的影响。通过溅射依次沉积纯钛和氮化钛靶来沉积多层膜。氮化钛层的厚度在300nm至800nm之间变化,而纯钛的厚度恒定在200nm。在目视观察下,所获得的多层膜看起来是金黄色的并且看起来是均匀的并且是粘附的,而在相同溅射条件下直接沉积到合金基底上的TiN单块膜部分地剥离。因此,发现多层薄膜比整体薄膜对合金的粘附性更高。根据两张膜的原子力显微镜(AFM)图像,在纳米级范围内观察到的每个TiN层的表面形态是粗糙的,具有凹坑和凸起,而在微米级范围内观察到的则是光滑的没有这样的坑洼。此外,基于原子力显微镜,发现在纳米尺度区域测量的表面粗糙度σ(RMS)随多层膜中TiN层厚度的增加而增加,尽管在微米尺度区域测量假定与TiN层的厚度无关。

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