首页> 外文期刊>Technical physics letters: Letters to the Russian journal of applied physics >Elastic stress relaxation in buffer layers based on porous strained InGaAs/GaAs superlattices
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Elastic stress relaxation in buffer layers based on porous strained InGaAs/GaAs superlattices

机译:基于多孔应变InGaAs / GaAs超晶格的缓冲层中的弹性应力松弛

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摘要

Potential advantages of using relaxed porous InGaAs/GaAs superlattices as buffer layers are considered. The X-ray diffraction patterns and the photoluminescence spectra of multilayer epitaxial InGaAs/GaAs heterostructures upon electrochemical etching are indicative of a partial relaxation of elastic stresses in the component epilayers. The stress relaxation in porous superlattices, used as buffer layers on both porous GaAs and periodic single crystal heterostructures, provides for a small but still significant positive effect related to a decrease in elastic energy accumulated in the growing structure.
机译:考虑到使用松弛的多孔InGaAs / GaAs超晶格作为缓冲层的潜在优势。多层外延InGaAs / GaAs异质结构在电化学蚀刻后的X射线衍射图和光致发光光谱表明组分外延层中弹性应力的部分松弛。用作多孔GaAs和周期性单晶异质结构上的缓冲层的多孔超晶格中的应力弛豫提供了与生长结构中累积的弹性能下降相关的小但仍显着的正效应。

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