首页> 外文期刊>Technical physics letters: Letters to the Russian journal of applied physics >Mechanism of ion loading of point emitters in planar edge field emission structures
【24h】

Mechanism of ion loading of point emitters in planar edge field emission structures

机译:平面边缘场发射结构中点发射器的离子加载机理

获取原文
获取原文并翻译 | 示例
           

摘要

A mathematical model of electron-optical processes has been developed and studied. The results of this analysis show that the ion current to a microscopic point emitter can be significantly reduced in planar edge field emission (PEFE) structures. The mechanism of this decrease is related to a special configuration of the electric field in the cathode-gate-anode system, which features a slope of the equipotential lines in the near-cathode region. The advantage of PEFE structures over the traditional systems based on Spindt cathodes is characterized by a decrease in the ion-current-related thermal load by more than five orders of magnitude. This decrease ensures high durability of the PEFE structures, which has been confirmed in experiment.
机译:已经开发和研究了电子光学过程的数学模型。该分析的结果表明,在平面边缘场发射(PEFE)结构中,可以显着减小流向微观点发射器的离子电流。这种减少的机制与阴极-栅极-阳极系统中电场的特殊配置有关,该结构的特征是在近阴极区域中等电位线的斜率。与基于Spindt阴极的传统系统相比,PEFE结构的优势在于与离子电流相关的热负荷降低了五个数量级以上。这种降低确保了PEFE结构的高耐久性,这已在实验中得到证实。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号