Field emission device for field emission triode - has convex hollow space in substrate of monocrystalline silicon@ with opening whose side edges form field emitter edges

摘要

The field emission device includes a substrate (2) of monocrystalline silicon with a surface from a 100 - crystal face. The substrate has a convex hollow space (3) whose side walls are formed by 111 - crystal faces of the substrate. The hollow space has an opening in the substrate surface, whose side edges are formed by tracing 111 - crystal faces on the surface. The side edges of the opening form field emitter edges (4), e.g. for the field emission cathode. A block (10) of insulating material is formed on the floor of the hollow and an electrically conducting layer (6), e.g. forming an extraction grid, is applied to the block. A second conducting layer (8), e.g. forming the anode, is provided on spacing blocks (12) above the substrate. ADVANTAGE - Can be produced in simple, controlled and reproducible process.