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Field Emission Properties of Dual Emitter in Planar Gate Structure

机译:平面门结构中双发射极的场发射特性

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摘要

In this paper, we investigated the field emission properties of planar gate structure, which is the gate and cathode electrode (buffer electrode) formed on same face of glass. Emitters and buffer electrodes were formed by screen printing method, which has many advantages in a large size panel. CNT emitter was formed on both buffer electrodes. Bi-polar pulses were applied to the buffer electrodes and high voltage of DC power was applied to the anode. In case of bi-polar pulse for planar structure, electron beam spreads more than normal gate structure or diode structure. It noted that increasing emission uniformity at 5 inch panel of dual emitter in planar gate structure. Optimum panel structure could be carried out by the evaluation of field emission properties depending on buffer electrode line width and applied voltage. Finally, we expect that field emission lamp is used LCD-BLU and general lighting of light source.
机译:在本文中,我们研究了平面栅结构的场发射特性,该结构是在玻璃的同一面上形成的栅电极和阴极电极(缓冲电极)。发射极和缓冲电极通过丝网印刷方法形成,这在大尺寸面板中具有许多优点。在两个缓冲电极上均形成了CNT发射极。将双极脉冲施加到缓冲电极,并将高压直流电源施加到阳极。在平面结构为双极脉冲的情况下,电子束的扩散比正常的栅极结构或二极管结构大。它指出,在平面栅极结构中,双发射极的5英寸面板处的发射均匀性不断提高。取决于缓冲电极线的宽度和施加的电压,可以通过场发射特性的评估来实现最佳的面板结构。最后,我们期望场发射灯用于LCD-BLU和一般光源。

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