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Design and implementation of a micron-sized electron column fabricated by focused ion beam milling

机译:聚焦离子束铣削制备微米级电子柱的设计与实现

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We have designed, fabricated and tested a micron-sized electron column with an overall length of about 700 microns comprising two electron lenses; a micro-lens with a minimal bore of 1 micron followed by a second lens with a bore of up to 50 microns in diameter to shape a coherent low-energy electron wave front. The design criteria follow the notion of scaling down source size, lens-dimensions and kinetic electron energy for minimizing spherical aberrations to ensure a parallel coherent electron wave front. All lens apertures have been milled employing a focused ion beam and could thus be precisely aligned within a tolerance of about 300 nm from the optical axis. Experimentally, the final column shapes a quasi-planar wave front with a minimal full divergence angle of 4 mrad and electron energies as low as 100 eV. (C) 2015 Elsevier B.V. All rights reserved.
机译:我们设计,制造和测试了一个微米大小的电子柱,该电子柱的总长度约为700微米,其中包括两个电子透镜。一个微透镜,其最小孔径为1微米,然后是第二个透镜,其孔径最大为50微米,以形成相干的低能电子波前。设计标准遵循缩小光源尺寸,透镜尺寸和动能的概念,以最小化球差,以确保平行相干电子波前。所有透镜光圈均采用聚焦离子束进行铣削,因此可以在距光轴约300 nm的公差内精确对准。实验上,最后一列的形状为准平面波阵面,其最小全发散角为4 mrad,电子能量低至100 eV。 (C)2015 Elsevier B.V.保留所有权利。

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