High resolution surface morphology measurements using EBSD cross-correlation techniques and AFM

摘要

The surface morphology surrounding wedge indentations in (0 0 1) Si has been measured using electron backscattered diffraction (EBSD) and atomic force microscopy (AFM). EBSD measurement of the lattice displacement field relative to a strain-free reference location allowed the surface uplift to be measured by summation of lattice rotations about the indentation axis. AFM was used in intermittent contact mode to determine surface morphology. The height profiles across the indentations for the two techniques agreed within 1 nm. Elastic uplift theory is used to model the data.