Sensitivity analysis of nanoparticles pushing manipulation by AFM in a robust controlled process

摘要

This paper investigates the sensitivity of nanoparticle parameters in a robust controlled process, by a compatible nanomanipulation model consisting of all effective phenomena in nanoscale. The dynamic model of nanoparticle displacement utilizes the Lund-Grenoble (LuGre) friction model, since it demonstrates pre-slip displacement, friction delay, various forces of failure and the stick-slip movement, with respect to other presented models. Also, the interaction force between nanoparticle and AFM cantilever tip are modeled by using the Derjaguin model. Sliding mode control (SMC) approach is used to provide the desired substrate motion trajectory, despite the challenges in the piezoelectric substrate motion control, consisting of thermal drift, hysteresis, and other uncertainties. In this paper, the dynamic model of nanoparticle manipulation is expressed to determine the nanoparticle behavior for substrate movement with desired trajectory and the effect of pre-process selections of the result of the manipulation. Depending on obtained diagrams for parameters sensitivity, the prediction of manipulation result is more precise, and also this is effective on choosing of proper initial condition and parameter selection in pushing purposes. Finally, it can be used to adjust proper pushing time and input for an accurate and successful pushing and assembly. It also provides a real-time visualization during microanomanipulation and increases complexity of the resulting created structures.