LOCALIZED HEATING OF THIN DIELECTRIC FILMS: THERMAL CONDUCTIVITY, INTERFACIAL THERMAL RESISTANCE, THERMAL STRESSES, AND DAMAGE

摘要

Recent measurements of the thermal conductivity of thin dielectric films have established that the thin film thermal conductivity may be much lower than that of the corresponding bulk solid, by as much as two orders of magnitude. We review measurements of thin film thermal conductivity, and models of the contributions of the film/substrate interface and the inhomogeneous film microstmcture (varying film grain size and grain-to-grain interfacial resistance) to the film thermal conductivity. We apply these measurements and concepts to a quantitative model of laser damage of thin dielectric films due to the localized absorption or' incident laser radiation by absorbing inclusions embedded within an othenvise non-absorbing thin film which is supported on a substrate, with particular attention to the film/substrate interface. Other applications are also discussed, for example, in the thermal interaction of already written and currently being written bits in laser marking of optical recording media.