...
首页> 外文期刊>Polymer international >Highly transparent flexible polydimethylsiloxane films - a promising candidate for optoelectronic devices
【24h】

Highly transparent flexible polydimethylsiloxane films - a promising candidate for optoelectronic devices

机译:高度透明的柔性聚二甲基硅氧烷薄膜-光电子器件的有希望的候选者

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

In the present work, a siloxane based flexible substrate for optoelectronic applications with improved flexibility and high temperature withstanding capacity has been fabricated and the details are reported. The structural and optical properties of the substrate were characterized and the optical transparency is found to be about 90% - 95% in the visible region. The substrate withstands temperatures up to 300 degrees C without significant degradation and has a low thermal coefficient of expansion. Fourier transform infrared spectral data show the materials in the prepared substrate and SEM studies show the surface and cross-sectional characteristics of the substrate. It has good mechanical strength, can withstand a high breaking load of 7 N, has a average tensile strength of 48.86 MPa and high average tensile modulus of 127.32 and also possesses excellent surface smoothness and resistance to both chemical and moisture with better rigidity; it will be a long lasting alternative for flexible plastic substrates. The optical characteristics such as refractive index (n) and extinction coefficient (k) are also reported. (c) 2016 Society of Chemical Industry
机译:在当前的工作中,已经制造了具有改善的柔韧性和高温耐受能力的用于光电应用的基于硅氧烷的挠性基板,并且已经报道了细节。对基材的结构和光学性质进行了表征,发现在可见光区域的光学透明度为约90%-95%。基材可承受高达300摄氏度的温度而不会发生明显降解,并且热膨胀系数低。傅立叶变换红外光谱数据显示了制备的基材中的材料,而SEM研究显示了基材的表面和截面特性。它具有良好的机械强度,可以承受7 N的高断裂载荷,平均抗拉强度为48.86 MPa,平均抗拉模量为127.32,并且具有出色的表面光滑度,耐化学性和耐湿性以及更好的刚性;这将是挠性塑料基材的长期替代品。还报道了诸如折射率(n)和消光系数(k)的光学特性。 (c)2016年化学工业学会

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号