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Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges

机译:大功率脉冲磁控溅射放电中静磁场和感应磁场的同时表征

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摘要

Hall currents generated in circular planar magnetrons can induce magnetic fields of several mT when operating in high power impulse magnetron sputtering (HiPIMS) mode. Near the target surface, the induced magnetic field is negligible compared to the static one. However, as we move away from the target surface the induced field becomes comparable or even stronger than the static field. In this paper, we investigate the induced magnetic field using Hall sensors, which can directly measure the effective magnetic field (the sum of the static and the induced magnetic fields) and with sufficient time resolution to observe the temporal evolution of the induced field during the HiPIMS pulse. We present the 2D temporal evolution of an induced magnetic field, showing its influence on the effective field. Based on the 2D induced magnetic field map, we calculate numerically the spatial distribution of the Hall currents generating the field, resulting in a current density up to 7A cm(-2). We present these results for both an unbalanced and balanced magnetron configuration.
机译:在高功率脉冲磁控溅射(HiPIMS)模式下运行时,圆形平面磁控管中产生的霍尔电流会感应出数mT的磁场。在目标表面附近,感应磁场与静态磁场相比可以忽略不计。但是,随着我们远离目标表面,感应场变得与静态场相当甚至更强。在本文中,我们使用霍尔传感器研究感应磁场,该传感器可以直接测量有效磁场(静磁场和感应磁场之和),并具有足够的时间分辨率,以观察磁场在感应期间的时间演化。 HiPIMS脉冲。我们介绍了感应磁场的2D时间演化,显示了它对有效磁场的影响。基于二维感应磁场图,我们通过数值计算产生磁场的霍尔电流的空间分布,从而产生高达7A cm(-2)的电流密度。我们为不平衡和平衡磁控管配置提供了这些结果。

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