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Apparatus for and method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges
Apparatus for and method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges
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机译:用于控制具有独立限制磁场的磁控溅射装置的装置和方法,以使经受单独放电的靶标分离
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摘要
A cathode sputter magnetron device is controlled so that there is a uniformity of material supplied to workpieces over the lives of plural geometrically spaced targets from which material is sputtered. Each target is subjected to a separate plasma discharge that is confined to the associated target by a separate magnetic field. The relative powers of the separate plasma discharges are controlled so that the relative powers change as a function of target erosion condition. The impedances of the separate discharges are controlled by varying each separate magnetic field in response to variable currents applied to electromagnets.
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