Theoretical and general

摘要

The initiated chemical vapour deposition (iCVD) of poly(1H,1H,2H,2H-perfluorodecyl acrylate) thin films has been described,where the creation of low surface energy films at a fast rate was achieved.Deposition was onto silicon wafers in a cylindrical reaction chamber.Monomer and t-butyl peroxide initiator were fed separately into the chamber which included Nichrome elements heated to 300°C.Reactor pressure was 100 Torr.The effects of substrate temperature were studied with temperatures between 39 and 59°C used.