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Mechanical confinement effects on the phase separation morphology of polymer blend thin films

机译:机械限制对聚合物共混薄膜相分离形态的影响

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We have measured the phase separation morphology of polystyrene-poly (methyl methacrylate) (PS-PMMA) blend films of thickness h on a silicon oxide (SiOx) substrate with a SiOx capping layer. We observe a novel phase separation morphology for small capping layer thicknesses L and a transition from lateral to lamellar morphology as L is increased. We present a simple model that explains the observed lateral morphology and the transition in morphology in terms of a balance between the free energy increase associated with forming the interfaces between PS-rich and PMMA-rich domains and the free energy increase associated with the elastic bending of the SiOx capping layer. The simple model reveals the dependence of the transition capping layer thickness L-c on the polymer blend film thickness h, and gives a reasonable quantitative prediction of L-c. [References: 26]
机译:我们已经测量了具有SiOx覆盖层的氧化硅(SiOx)基板上厚度为h的聚苯乙烯-聚(甲基丙烯酸甲酯)(PS-PMMA)共混膜的相分离形态。我们观察到小覆盖层厚度L的新型相分离形态,随着L的增加,从横向形态向层状形态过渡。我们提供了一个简单的模型,该模型通过与在富含PS和PMMA的畴之间形成界面相关的自由能增加与与弹性弯曲相关的自由能增加之间的平衡来解释观察到的横向形态和形态转变SiOx覆盖层的厚度。该简单模型揭示了过渡覆盖层厚度L-c对聚合物共混物膜厚度h的依赖性,并给出了合理的L-c定量预测。 [参考:26]

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