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EDGE STRAIN RELAXATION IN QUANTUM WELLS GROWN ON THE CLEAVED EDGE OF A STRAINED SEMICONDUCTOR SUPERLATTICE

机译:在应变半导体超晶格的切边上生长的量子阱中的边缘应变松弛

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In this Brief Report we address, from a theoretical point of view, the question of the existence and the localization of strain-induced quantum wires when one deposits a strained quantum well on the cleaved edge of a strained superlattice (such as a CdTe quantum well on the cleaved edge of a CdTe/CdxZn1-xTe superlattice). For systems in which ternary layers are made of perfectly homogeneous composition alloys, and with no width fluctuation, we show a very strong decay of the strain modulation versus the distance to the cleavage interface. We also demonstrate a strong strain relaxation near the edge of the structure. [References: 12]
机译:在此简短的报告中,我们从理论的角度解决了当将应变量子阱沉积在应变超晶格的分裂边缘(例如CdTe量子阱)上时,应变诱导量子线的存在和局部化的问题。在CdTe / CdxZn1-xTe超晶格的切割边缘上)。对于三元层由完全均质的成分合金制成且没有宽度波动的系统,我们显示出应变调制相对于解理界面距离的衰减非常大。我们还展示了结构边缘附近的强烈应变松弛。 [参考:12]

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