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PHONONS IN (110) SURFACES OF III-V COMPOUND SEMICONDUCTORS

机译:III-V复合半导体的(110)表面中的声子

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High-resolution electron energy-loss spectroscopy was applied to determine phonon dispersions of cleaved AlSb(110), GaP(110), GaSb(110), and InAs(110) surfaces. Besides the acoustic surface waves and the optical Fuchs-Kliewer modes additional flat phonon bands were detected in all materials. The experimental results agree very well with recent ab initio calculations of surface phonon dispersion curves. For GaP(110), several phonon modes are observed within the fundamental gap between acoustic and optical bulk phonon bands. In AlSb(110) a gap mode is detected very close to the bulk optical band edge whereas the GaSb gap is free of surface-localized states. The measurements confirm theoretical predictions that significant gap modes exist at these surfaces if the anion mass is smaller than the cation mass. For the acoustic and the Fuchs-Kliewer modes chemical trends are demonstrated. The differences of the excitation energies in the materials considered depend only on the anion and cation masses as well as the nearest-neighbor distances. [References: 44]
机译:高分辨率电子能量损失谱用于确定分裂的AlSb(110),GaP(110),GaSb(110)和InAs(110)表面的声子色散。除了声表面波和光学Fuchs-Kliewer模式外,在所有材料中还检测到其他平坦声子带。实验结果与表面声子色散曲线的最近从头算非常吻合。对于GaP(110),在声学和光学体声子频带之间的基本间隙内观察到几种声子模式。在AlSb(110)中,检测到的间隙模式非常靠近整体光学带边缘,而GaSb间隙则没有表面局部状态。测量结果证实了理论预测,如果阴离子质量小于阳离子质量,则在这些表面上将存在明显的间隙模式。对于声学和Fuchs-Kliewer模式,已证明了化学趋势。所考虑的材料中激发能的差异仅取决于阴离子和阳离子的质量以及最接近的距离。 [参考:44]

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