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首页> 外文期刊>Physical Review, B. Condensed Matter >METALLIC CHARACTER OF THE K/SI(100)-(2X1) INTERFACE AT SATURATION COVERAGE - A MOTT-HUBBARD MODEL CALCULATION OF ITS NEAR-FERMI-LEVEL BAND STRUCTURE
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METALLIC CHARACTER OF THE K/SI(100)-(2X1) INTERFACE AT SATURATION COVERAGE - A MOTT-HUBBARD MODEL CALCULATION OF ITS NEAR-FERMI-LEVEL BAND STRUCTURE

机译:饱和温度下K / SI(100)-(2X1)界面的金属特性-近费米能级结构的Mott-Hubbard模型计算

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摘要

Recent experiments that probe the Fermi surface and the electronic structure near the Fermi level of K/Si(100)-(2x1) interfaces at saturation coverage have shown a metallic interface. These experiments are here discussed in the light of a two-dimensional Mott-Hubbard model. Our calculated band structure is consistent with them. Specifically it is shown that, by withdrawing a small amount of the (itinerant) electron charge from the interface, one obtains an empty potassium band and an almost full pi*Si band that shows a hole pocket at Gamma, in close agreement with the experimental results. If all the electron charge were assumed itinerant, one would obtain instead a full Si band and a semiconducting interface. [References: 29]
机译:在饱和覆盖范围内探测费米表面和费米能级附近的K / Si(100)-(2x1)界面的费米能级附近的电子结构的最新实验显示出金属界面。这些实验是根据二维Mott-Hubbard模型进行讨论的。我们计算出的能带结构与它们一致。具体而言,显示出通过从界面上抽取少量(流动性)电子电荷,可以得到一个空的钾带和一个几乎完整的pi * Si带,该带在Gamma处显示出空穴,这与实验结果非常吻合。结果。如果假定所有的电子电荷都是流动的,则将获得一个完整的Si带和一个半导体界面。 [参考:29]

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