首页> 外文期刊>IEEE transactions on very large scale integration (VLSI) systems >A Power Delivery and Decoupling Network Minimizing Ohmic Loss and Supply Voltage Variation in Silicon Nanoscale Technologies
【24h】

A Power Delivery and Decoupling Network Minimizing Ohmic Loss and Supply Voltage Variation in Silicon Nanoscale Technologies

机译:功率传输和去耦网络,可将硅纳米级技术中的欧姆损耗和电源电压变化降至最低

获取原文
获取原文并翻译 | 示例

摘要

di/dt and IR events may cause large supply voltage variations and ohmic losses due to system parasitics. Today, decoupling capacitance is used to minimize the supply voltage variation, and parallelism in the power delivery path is used to reduce ohmic loss. Future integrated circuits, however, will exhibit large enough currents and current transients to mandate additional safeguards. A novel, distributed power delivery and decoupling network is introduced that reduces the supply voltage variation magnitude by more than 66% or the future ohmic loss by more than 27% (compared to today's power delivery and decoupling networks) using conventional processing and packaging techniques
机译:di / dt和IR事件可能会由于系统寄生效应而导致较大的电源电压变化和欧姆损耗。如今,去耦电容被用于使电源电压变化最小化,而功率传输路径中的并联则被用于减少欧姆损耗。然而,未来的集成电路将展现出足够大的电流和电流瞬变,以强制执行其他保护措施。引入了一种新颖的分布式电源输送和去耦网络,使用传统的处理和封装技术,可将电源电压变化幅度降低66%以上,或将未来的欧姆损耗降低27%以上(与当今的电源输送和去耦网络相比)

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号