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Reliability-Aware Design Flow for Silicon Photonics On-Chip Interconnect

机译:硅光子片上互连的可靠性意识设计流程

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摘要

Intercore communication in many-core processors presently faces scalability issues similar to those that plagued intracity telecommunications in the 1960s. Optical communication promises to address these challenges now, as then, by providing low latency, high bandwidth, and low power communication. Silicon photonic devices presently are vulnerable to fabrication and temperature-induced variability. Our fabrication and measurement results indicate that such variations degrade interconnection performance and, in extreme cases, the interconnection may fail to function at all. In this paper, we propose a reliability-aware design flow to address variation-induced reliability issues. To mitigate effects of variations, limits of device design techniques are analyzed and requirements from architecture-level design are revealed. Based on this flow, a multilevel reliability management solution is proposed, which includes athermal coating at fabrication-level, voltage tuning at device-level, as well as channel hopping at architecture-level. Simulation results indicate that our solution can fully compensate variations thereby sustaining reliable on-chip optical communication with power efficiency.
机译:目前,多核处理器中的内核间通信面临的可扩展性问题类似于1960年代困扰城市间电信的那些问题。届时,光通信有望通过提供低延迟,高带宽和低功率通信来解决这些挑战。目前,硅光子器件容易受到制造和温度引起的可变性的影响。我们的制造和测量结果表明,这种变化会降低互连性能,在极端情况下,互连可能根本无法正常工作。在本文中,我们提出了一种可感知可靠性的设计流程,以解决因变化引起的可靠性问题。为了减轻变化的影响,分析了设备设计技术的局限性,并揭示了体系结构级设计的要求。基于此流程,提出了一种多级可靠性管理解决方案,其中包括制造级的无热镀膜,设备级的电压调整以及体系结构级的通道跳变。仿真结果表明,我们的解决方案可以完全补偿变化,从而以功率效率维持可靠的片上光通信。

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