首页> 外文期刊>Very Large Scale Integration (VLSI) Systems, IEEE Transactions on >On the Nonvolatile Performance of Flip-Flop/SRAM Cells With a Single MTJ
【24h】

On the Nonvolatile Performance of Flip-Flop/SRAM Cells With a Single MTJ

机译:具有单个MTJ的触发器/ SRAM单元的非易失性性能

获取原文
获取原文并翻译 | 示例

摘要

In this brief, three nonvolatile flip-flop (FF)/SRAM cells that utilize a single magnetic tunneling junction (MTJ) as nonvolatile resistive element are proposed. These cells have the same core (i.e., 6T) but they employ different numbers of MOSFETs to implement the so-called instantly ON, normally OFF mode of operation. The additional transistors are utilized for the restore operation to ensure that the data stored in the nonvolatile circuitry can be written back into the FF core once the power is made available. These three cells (7T, 9T, and 11T) are extensively analyzed in terms of their operations in 32 nm technology, such as operational delays (for the write, read, and restore operations), the static noise margin (SNM), critical charge and process variations (in both the MOSFETs and the resistive element). Simulation results show that an increase in the number of MOSFETs in the cells causes improvements in critical charge and tolerance to process variations at the expense of an increase in power dissipation. The SNM and the delay of the restore operation, however, do not necessarily increase with the number of MOSFETs in the cell, but rather on the control of access to the storage nodes from the single MTJ.
机译:在本简介中,提出了三个利用单个磁隧道结(MTJ)作为非易失性电阻元件的非易失性触发器(FF)/ SRAM单元。这些单元具有相同的核心(即6T),但是它们使用不同数量的MOSFET来实现所谓的即时ON,通常OFF模式的操作。额外的晶体管用于恢复操作,以确保一旦电源可用,就可以将存储在非易失性电路中的数据写回到FF内核。对这三个单元(7T,9T和11T)在32 nm技术中的操作进行了广泛的分析,例如操作延迟(用于写入,读取和还原操作),静态噪声容限(SNM),临界电荷和工艺变化(在MOSFET和电阻元件中)。仿真结果表明,单元中MOSFET数量的增加导致临界电荷的提高和对工艺变化的容忍度的提高,但功耗却有所增加。但是,SNM和恢复操作的延迟不一定随单元中MOSFET的数量而增加,而是随着从单个MTJ到存储节点的访问控制而增加。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号