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Oh And Interstitial-h_2 Concentration Dependence Of Intensities Of X-ray-induced Absorption Of Type-iii Fused Silica

机译:OH和填隙h_2浓度依赖于X射线诱导的iii型熔融石英吸收的强度

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摘要

Hydroxyl and interstitial-H_2 concentration dependence of X-ray-induced absorption of type-III fused silica up to an irradiation time of 6 h was studied. Induced absorption spectra in the fused silica irradiated with X-rays from a Rh target with a dosage of 2×10~4 C kg~(-1) h~(-1) were reproduced by six Gaussian absorption bands at 3.8, 4.8, 5.0, 5.4, 5.8 and 6.5 eV. Intensities of these absorption bands increased with the power of the irradiation time. OH and interstitial-H_2 concentration dependence at 1 h and 6 h are similar in the doubly logarithmic plot. A linear relationship between the intensities of each absorption component and the H_2 concentration was observed, while no clear dependence of these intensities on the OH concentration was observed. Intensities of absorption bands decreased linearly as the H_2 concentration increased except for 5.0-eV band in which the intensity increased as the H_2 concentration increased.
机译:研究了X射线诱导的III型熔融二氧化硅吸收至6 h的时间对羟基和间隙H_2浓度的依赖性。用3.8、4.8、6、3、4、6、5、6、5、6、5、6、5、6、5、6、5 5.0、5.4、5.8和6.5 eV。这些吸收带的强度随着照射时间的增加而增加。在双对数图中,OH和间隙H_2浓度在1 h和6 h的依赖性相似。观察到每种吸收组分的强度与H_2浓度之间的线性关系,而未观察到这些强度对OH浓度的明确依赖性。吸收带的强度随H_2浓度的增加呈线性下降,但5.0-eV的吸收带强度随H_2浓度的增加而增加。

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