ガスバリア膜用新規PECVD材料TG-41の開発

摘要

ガスバリァ膜は水蒸気や酸素等のガス透過が非常に少ない事を特徴とし、その特性により主に食品包装等に用いられている。また、今後太陽電池や電子デバィス、有機発光ダイオード（OLED)デバイスなどの保護層としての応用が期待されている。%We have developed a novel precursor, TG-41, for high gas barrier film deposition by plasma enhanced chemical vapor deposition (PECVD). This precursor is a liquid organosilane compound which shows high vapor pressure of 100 Torr at 86℃. Colorless and transparent gas barrier films were obtained from TG-41 by PECVD process, and furthermore, 800 nm-thick single gas barrier layer deposited on polyethylene naphthalate substrate showed very low water vapor transmission rate of 2.0 × 10~(-4) g/m~2/day or lower under 40℃, 90%RH condition measured by gas chromatography method.