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Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

机译:反应磁控溅射法制备Eu掺杂氧化碲薄膜的结构和光学参数

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In this work the structural properties and photoluminescence of tellurium dioxide thin films doped by europium were described. Thin films were deposited by magnetron sputtering method and simultaneously heated at 200 degrees C. Presence of Eu ions and their valence states was confirmed by X-ray photoemission spectroscopy measurements. The structure of the films as well as the influence of europium dopant on crystalline structure of the films was examined by X-ray diffraction method. Morphology of the samples was observed by atomic force microscope. Doping by europium didn't change structural parameters. Optical measurements showed photoluminescence from Eu2+ and Eu3+ ions. However, in the spectrum there is no line corresponding to D-5(0) -> F-7(2) transition due to an electric-dipole transition, usually present in amorphous surrounding.
机译:在这项工作中,描述了by掺杂的二氧化碲薄膜的结构性质和光致发光。通过磁控溅射法沉积薄膜,并同时在200摄氏度下加热。Eu离子的存在及其化合价通过X射线光电子能谱测量得到证实。通过X射线衍射法研究了膜的结构以及of掺杂剂对膜的晶体结构的影响。用原子力显微镜观察样品的形态。 by掺杂并没有改变结构参数。光学测量显示来自Eu2 +和Eu3 +离子的光致发光。但是,在光谱中,由于通常存在于非​​晶态环境中的电偶极跃迁,没有对应于D-5(0)→F-7(2)跃迁的谱线。

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