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Investigation of the geometric and electronic structures of ErSi_((2-x)) with the density functional theory and comparison with STM images

机译:用密度泛函理论研究ErSi _((2-x))的几何和电子结构并与STM图像进行比较

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摘要

Study of ErSi_((2-x)) surfaces system is submitted at one controversy in reason of the STM images bias voltage dependence. In this article, we have investigated by means of calculations issued of the density functional theory (DFT), atomic surface density for 2D and 3D epitaxial erbium silicide on Si(111). DOS (density of state) in front of the surface, calculated with Wien2k, permits to simulate scanning tunneling microscopy (STM) images in function of the bias voltage and to discriminate the different surface arrangements. The calculations confirm the model of structure accepted and give some new elements in order to close the controversy on the question.
机译:由于STM图像偏置电压的依赖性,对ErSi _((2-x))表面系统的研究存在争议。在本文中,我们通过计算密度泛函理论(DFT),Si(111)上2D和3D外延硅化的原子表面密度进行了研究。用Wien2k计算的表面前面的DOS(状态密度)可以模拟随偏压变化的扫描隧道显微镜(STM)图像,并区分不同的表面排列。计算结果证实了所接受的结构模型,并给出了一些新的要素,以结束对该问题的争论。

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