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Growth of nano-crystalline metal dots on the Si(111)-7 × 7 surface saturated with C_2H_5OH

机译:用C_2H_5OH饱和的Si(111)-7×7表面上纳米晶体金属点的生长

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Metal atom on the Si(111)-7 × 7 surface undergoes migration by hopping among Si-adatom and Si-rest atom. If the hopping migration is prohibited, how change the deposited metals? In this paper, we studied the deposition of metals on the Si(111)-7 × 7 surface saturated with C_2H5_OH, on which the whole Si-rest atoms are changed to Si-H so that the hoping migration of metals will be prohibited. We found the growth of ca. 5 nm of crystalline dots by the deposition of Sn, Zn and Ag. Interestingly, Ag dots undergo layer-by-layer growth so that the surface is covered with 5 nm size dots with uniform height. When the hopping migration is prohibited, growth of dots is controlled by the kinetics of precursor state atoms instead of the lattice energy relating to lattice matching or strain.
机译:Si(111)-7×7表面的金属原子通过在Si原子和Si剩余原子之间跳跃而迁移。如果禁止跳变迁移,如何改变沉积的金属?在本文中,我们研究了金属在C_2H5_OH饱和的Si(111)-7×7表面上的沉积,在该表面上整个Si剩余原子都变为Si-H,从而阻止了金属的跳跃迁移。我们发现ca的增长。通过沉积Sn,Zn和Ag获得5 nm的结晶点。有趣的是,Ag点逐层生长,因此表面覆盖了5 nm大小且高度均匀的点。当禁止跳变迁移时,点的生长由前体状态原子的动力学控制,而不是由与晶格匹配或应变相关的晶格能量控制。

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