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Oxygen induced segregation of aluminum to alpha-Cu-Al(100) alloy surfaces studied by low energy ion scattering and X-ray photoelectron spectroscopy

机译:通过低能离子散射和X射线光电子能谱研究了氧诱导的铝向Al-Cu-Al(100)合金表面的偏析

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The effect of annealing temperature on the surface composition of alpha-Cu-Al(100) alloys for aluminum concentrations of 5, 1.2 and 17 at% was investigated using X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). Two initial states of the sample surfaces were examined: sputter-cleaned and oxidized. The effect of annealing temperature on segregation is different for sputter-cleaned and oxidized samples. Aluminum preferential sputtering and strong oxygen induced aluminum segregation were detected oil all examined samples. Whilst for the sputter-cleaned surfaces a small thermal induced segregation was observed, the combination of annealing and oxygen exposure resulted in aluminum enrichment in the 100-300% range relative to the bulk concentration. The segregation rate is proportional to the aluminum concentration for sputter-cleaned surfaces and displays a maximum for the oxidized alpha-Cu-Al(12 at.%)(100) surface. (c) 2006 Published by Elsevier B.V.
机译:使用X射线光电子能谱(XPS)和低能离子散射(LEIS)研究了退火温度对铝浓度为5、1.2和17at%的α-Cu-Al(100)合金表面成分的影响。检查了样品表面的两种初始状态:溅射清洗和氧化。对于溅射清洗和氧化的样品,退火温度对偏析的影响是不同的。在所有检查的样品中均检测到铝优先溅射和强氧诱导的铝偏析。对于溅射清洁的表面,观察到少量热诱导的偏析,退火和氧气暴露的结合导致铝的富集相对于总浓度为100-300%。对于溅射清洁的表面,偏析率与铝浓度成正比,对于氧化的α-Cu-Al(12 at。%)(100)表面,偏析率显示最大值。 (c)2006年由Elsevier B.V.发布

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