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Step formation on hydrogen-etched 6H-SiC{0001} surfaces

机译:在氢蚀刻的6H-SiC {0001}表面上形成台阶

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The formation of step bunches and/or facets on hydrogen-etched 6H-SiC(0001) and (0001) surfaces has been studied, using both nominally on-axis and intentionally miscut (i.e. vicinal) substrates. It is found that small miscuts on the (0001) surface produce full unit-cell high steps, while half unit-cell high steps are observed on the (0001) surface. The observed step normal direction is found to be (1100) for both surfaces. Hence, for intentionally miscut material, a miscut oriented towards this direction produces much better order in the step array compared to a miscut oriented towards a (1120) direction. For (0001) vicinal surfaces that are miscut towards the (1100) direction, the formation of surface ripples is observed for 3° miscut and the development of small facets (nanofacets) is found for higher miscut angles. Much less faceting is observed on miscut (0001) surfaces. Additionally, the (0001) surface is found to have a much larger spatial anisotropy in step energies than the (0001) surface.
机译:已经研究了在氢蚀刻的6H-SiC(0001)和(0001)表面上形成台阶束和/或刻面的过程,既使用了名义上的轴向切割,也使用了故意切割的(即邻近的)衬底。已经发现,在(0001)表面上的小的错切会产生完整的晶胞高阶跃,而在(0001)表面上观察到一半的晶胞高阶跃。发现观察到的两个表面的阶梯法线方向均为(1100)。因此,对于故意误切的材料,与朝向(1120)方向的误切相比,朝向该方向的误切在阶跃阵列中产生的顺序更好。对于朝(1100)方向错切的(0001)相邻表面,对于3°错切观察到了表面波纹的形成,并且对于较大的错切角度发现了小刻面(nanofacets)的形成。在未切割(0001)的表面上观察到的切面少得多。此外,发现(0001)表面的阶跃能量具有比(0001)表面更大的空间各向异性。

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