首页> 外文期刊>Surface Science >First-principles study of atomic structures and electronic properties of ultrathin Bi films on Ge(111)
【24h】

First-principles study of atomic structures and electronic properties of ultrathin Bi films on Ge(111)

机译:Ge(111)上超薄Bi薄膜的原子结构和电子性质的第一性原理研究

获取原文
获取原文并翻译 | 示例
           

摘要

The atomic and electronic structures of ultrathin bismuth films on Ge(111) surface were investigated using first-principles calculations at Bi coverages ranging from 1/3 ML to 5 ML. Morphology of the surfaces varied as the coverage of Bi was increased. The first layer of bismuth atoms followed the well-known trimer model, exhibiting large Rashba spin-splittings. At 2 ML, bismuth atoms of the second monolayer form the second stacking layer of trimers, whereas at 3 ML and 5 ML, bismuth atoms of the two topmost monolayers form a buckled honeycomb structure. While the electronic structures of the two topmost layers exhibit two-dimensional nontrivial topological insulating phase, the bismuth atoms lying under these layers play an important role in p-type doping of the system.
机译:使用第一性原理计算了Bi覆盖范围为1/3 ML至5 ML的Ge(111)表面超薄铋膜的原子和电子结构。随着Bi的覆盖率增加,表面的形态变化。铋原子的第一层遵循众所周知的三聚体模型,表现出大的Rashba自旋分裂。在2 ML时,第二个单分子层的铋原子形成三聚体的第二堆积层,而在3 ML和5 ML时,两个最顶层的单分子层的铋原子形成弯曲的蜂窝结构。虽然两个最顶层的电子结构表现出二维非平凡的拓扑绝缘相,但是位于这些层下面的铋原子在系统的p型掺杂中起着重要的作用。

著录项

  • 来源
    《Surface Science》 |2014年第8期|68-75|共8页
  • 作者单位

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan,Graphene Research Centre, National University of Singapore, Singapore 117542, Singapore,Department of Physics, National University of Singapore, Singapore 117542, Singapore;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Graphene Research Centre, National University of Singapore, Singapore 117542, Singapore,Department of Physics, National University of Singapore, Singapore 117542, Singapore;

    Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, CA 90095-1595, USA;

    Department of Physics, Northeastern University, Boston, MA 02115, USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Bismuth thin films; Ge(111); First-principles calculations;

    机译:铋薄膜;锗(111);第一性原理计算;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号