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机译:Bi_2Te_3(111)衬底上生长的超薄Bi(III)薄膜的原子和电子结构:应变诱导的拓扑相变的证据。
Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan;
Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan;
Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa 277-8581, Japan;
Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan;
Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan;
UVSOR Facility, Institute for Molecular Science, Okazaki 444-8585, Japan;
UVSOR Facility, Institute for Molecular Science, Okazaki 444-8585, Japan;
UVSOR Facility, Institute for Molecular Science, Okazaki 444-8585, Japan;
Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa 277-8581, Japan;
Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan;
Department of Physics, Ochanomizu University, 2-1-1 Otsuka, Bunkyo-ku, Tokyo 112-8610, Japan;
insulators; electron states at surfaces and interfaces; insulators;
机译:勘误:Bi-2Te-3(111)衬底上生长的超薄Bi(III)薄膜的原子和电子结构:应变诱导的拓扑相变的证据。牧师109,227401(2012)]
机译:Si(111)上生长的超薄准自立Bi_2Te_3薄膜的拓扑极限
机译:通过分子束外延在(111)BaF_2衬底上生长的Bi_2Te_3拓扑绝缘体薄膜的结构特性
机译:MBE-种植拓扑绝缘体BI_2TE_3薄膜的成核和生长动态(111)
机译:Si(111)和MgO(001)表面上超薄铁膜的原子和电子结构
机译:控制Si(111)表面上分子束外延生长的In-Bi原子膜的极性
机译:超薄准防独立式Bi2te3films在Si上生长的拓扑极限(111)