Influence of processing parameters on deposition rate and crystal structure of reactively sputtered HfC

摘要

Hafnium carbide is one of the materials with the most potential that can be used for high temperature oxidation resistant coatings. So far, HfC coatings are mainly being produced by chemical vapour deposition technique. In this work, HfC coatings were produced using a reactive magnetron sputtering method. The reactive gas used in these experiments was mixture of CH₄ and H₂. The study is focused mainly on the effect of process parameters, applied radio frequency (RF) power, process pressure and reactive gas flow, on the deposition rate and crystal structure of the deposited HfC coatings.