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机译:厚度对磁控溅射射频生长Zn_(0.97)Co_(0.02)In_(0.01)O薄膜物理和电学性质的影响
Univ Sfax, Res Unit PMISI, Fac Sci Sfax, Route Soukra Km 3-5,BP1171, F-3000 Sfax, Tunisia;
Univ Sfax, Res Unit PMISI, Fac Sci Sfax, Route Soukra Km 3-5,BP1171, F-3000 Sfax, Tunisia;
Univ Lille North France, ULCO, UDSMM, F-62228 Calais, France;
Univ Lille North France, ULCO, UDSMM, F-59140 Dunkerque, France;
Univ Lille North France, ULCO, UCEIV EA 4492, F-59140 Dunkerque, France;
Univ Lille North France, ULCO, UCEIV EA 4492, F-59140 Dunkerque, France;
Univ Lille North France, ULCO, UDSMM, F-62228 Calais, France;
Univ Sfax, Res Unit PMISI, Fac Sci Sfax, Route Soukra Km 3-5,BP1171, F-3000 Sfax, Tunisia;
Zn0.97Co0.02In0.01O thin film; RF magnetron sputtering; Raman spectroscopy; Optical constants; Resistivity electrical; Factor of merit;
机译:退火对磁控溅射Zn_(0.98)Cr_(0.02)O薄膜结构和光致发光性能的影响
机译:高温退火对射频磁控溅射生长(Zn_(0.91)Mn_(0.09))O薄膜磁性的影响
机译:射频磁控溅射沉积Zn_(0.98)Cr_(0.02)O薄膜上氧与氩流量比的结构和光学性质
机译:Zn_(1-X)V_XO的纳米结构薄膜的生长使用具有低和高钒的RF-磁控溅射:物理化学表征,光学和电学性能评估
机译:射频磁控溅射生长的GaN薄膜的特性用于制造AlGaN / GaN HEMT生物传感器
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:射频磁控溅射在压缩应变Si83Ge17上HfAlOx薄膜的界面微观结构和电性能