首页> 外文期刊>Superlattices and microstructures >Analysis of current-voltage-temperature (I-V-T) and capacitance-voltage-temperature (C-V-T) characteristics of Ni/Au Schottky contacts on n-type InP
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Analysis of current-voltage-temperature (I-V-T) and capacitance-voltage-temperature (C-V-T) characteristics of Ni/Au Schottky contacts on n-type InP

机译:n型InP上Ni / Au肖特基接触的电流-电压-温度(I-V-T)和电容-电压-温度(C-V-T)特性分析

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The current-voltage (I-V) and capacitance-voltage (C-V) characteristics of Ni/Au-InP (111) Schottky contacts have been studied in the temperature range 210-420 K in steps of 30 K. The forward I-V characteristics are analyzed on the basis of thermionic emission (TE) theory assuming a Gaussian distribution of the barrier heights (BHs). The estimated Schottky barrier height (SBH) of an Ni/Au Schottky contact is in the region of 0.38 eV (I-V), 0.93 eV (C-V) at 210 K and 0.70 eV (I-V), 0.73 eV (C-V) at 420 K, respectively. The calculated ideality factor of an Ni/Au Schottky barrier diode (SBD) varies from 3.25 at 210 K to 1.99 at 420 K. It has been observed that the ideality factor decreases while the zero-bias BH increases with increasing temperature. This behavior has been interpreted by the assumption of a Gaussian distribution of BHs due to barrier inhomogeneities that prevail at the metal-semiconductor interface. The zero-bias BH Φ_(bo) versus 1 /2kT plot has been drawn to obtain evidence of the Gaussian distribution of the BHs. The mean value of Φ_(bo) obtained is 1.01 eV, with standard deviation σ_o = 155 meV. From the modified Richardson plot, the mean BH Φ_(bo) is 0.97 eV and the Richardson constant {A~(**)) is 4.507 A cm~(-2) K~(-2), which is close to the theoretical value of 9.4 A cm~(-2) K~(-2). The discrepancy between SBHs obtained from the I-V and C-V measurements is also explained. The experimentally observed E_0 value of 5.235 meV agrees very well with the theoretically calculated value of E_(00) = 5.801 meV.
机译:Ni / Au / n-InP(111)肖特基接触的电流-电压(IV)和电容-电压(CV)特性已在210-420 K的温度范围内以30 K为步长进行了研究。正向IV特性为假设势垒高度(BHs)为高斯分布,则根据热电子发射(TE)理论进行分析。 Ni / Au肖特基接触的估计肖特基势垒高度(SBH)在0.38 eV(IV),210 K下为0.93 eV(CV)和420 K下0.70 eV(IV),0.73 eV(CV)的范围内,分别。 Ni / Au肖特基势垒二极管(SBD)的计算出的理想因子从210 K时的3.25到420 K时的1.99不等。已经发现,理想因子在温度升高时会降低,而零偏压BH会升高。由于在金属-半导体界面处普遍存在的势垒不均匀性,BHs的高斯分布的假设已解释了此行为。绘制了零偏BHΦ_(bo)与1 / 2kT的关系图,以获得BH的高斯分布的证据。获得的Φ_(bo)的平均值为1.01 eV,标准偏差σ_o= 155 meV。根据修正的Richardson图,平均BHΦ_(bo)为0.97 eV,Richardson常数{A〜(**))为4.507 A cm〜(-2)K〜(-2),与理论值相近。值为9.4 A cm〜(-2)K〜(-2)。还说明了从I-V和C-V测量获得的SBH之间的差异。实验观察到的E_0值为5.235 meV与理论计算的E_(00)= 5.801 meV值非常吻合。

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