机译:具有Γ栅极和凹入p缓冲层的4H-SiC MESFET的性能得到改善
Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, College of Microelectronics, Xidian University, Xi'an 710071, China;
Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, College of Microelectronics, Xidian University, Xi'an 710071, China,School of Microelectronics, Xidian University, 710071 Xi'an, China;
Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, College of Microelectronics, Xidian University, Xi'an 710071, China;
Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, College of Microelectronics, Xidian University, Xi'an 710071, China;
4H-SiC MESFET; Γ-gate and recessed p-buffer layer (ΓRP); Drain saturation current; Breakdown voltage; Cut-off frequency;
机译:具有双凹p缓冲层的改进的多凹4H-SiC MESFET
机译:具有部分重掺杂沟道的改进的双凹P缓冲4H-SiC MESFET
机译:具有双上栅极和嵌入式p缓冲器的新型4H-SiC MESFET
机译:改进了具有凹陷漏极漂移区和凹陷的P缓冲层的栅极栅极4H-SiC MESFET
机译:1.2 kV 4H-SiC平面栅极功率MOSFET的设计,分析和优化,用于改进的高频切换
机译:改进的DRUS 4H-SiC MESFET具有高功率附加效率
机译:改进了具有凹陷漏极漂移区和凹陷的P缓冲层的栅极栅极4H-SiC MESFET