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Investigation of Al doping concentration effect on the structural and optical properties of the nanostructured CdO thin film

机译:Al掺杂浓度对纳米CdO薄膜结构和光学性能的影响

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Nanostructured aluminium (Al) doped cadmium oxide (CdO) films with highly electrical conductivity and optical transparency have been deposited for the first time on soda-lime glass substrates preheated at 250 ℃ by ultrasonic spray coating technique. The aluminium dopant content in the CdO film was changed from 0 to 5 at%. The influencing of Al doping on the structural, morphological, electrical and optical properties of the CdO nanostructured films has been investigated. Atomic force microscopy study showed the grain size of the films is an order of nanometers, and it decreases with increase in Al dopant content. All the films having cubic structure with a lattice parameter 4.69 A were determined via X ray diffraction analysis. The optical band gap value of the films, obtained by optical absorption, was found to increase with Al doping. Electrical studies exhibited mobility, carrier concentration and resistivity of the film strongly dependent on the doping content. It has been evaluated that optical band gap, and grain size of the nanostructured CdO film could be modified by Al doping.
机译:纳米结构的铝(Al)掺杂的氧化镉(CdO)薄膜具有较高的导电性和光学透明性,这是首次在超声喷涂技术中将其预热到250℃的钠钙玻璃基板上。 CdO膜中的铝掺杂剂含量从0更改为5 at%。研究了Al掺杂对CdO纳米结构膜的结构,形貌,电学和光学性质的影响。原子力显微镜研究表明,薄膜的晶粒尺寸约为纳米级,并且随着Al掺杂剂含量的增加而减小。通过X射线衍射分析确定所有晶格参数为4.69A的立方结构的膜。发现通过光吸收获得的膜的光学带隙值随Al掺杂而增加。电学研究显示出膜的迁移率,载流子浓度和电阻率很大程度上取决于掺杂含量。已经评估出,可以通过Al掺杂来改变纳米结构的CdO膜的光学带隙和晶粒尺寸。

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