Design and simulation of oxide and doping engineered lateral bipolar junction transistors for high power applications

摘要

In this paper, we propose new structures of lateral bipolar junction transistor (LBJT) on silicon on insulator (SOI) with improved performance. The proposed devices are lateral bipolar transistors with multi doping zone collector drift region and a thick buried oxide under the collector region. Calibrated simulation studies have revealed that the proposed devices have higher breakdown voltage than the conventional device, that too at higher drift doping concentration. This has resulted in improved tradeoff between the on-resistance and the breakdown voltage of the proposed devices. It has been observed that the proposed device with two collector drift doping zones and a buried oxide thick step results in ～190% increase in the breakdown voltage than the conventional device. The further increase in the number of collector drift doping zones from two to three has increased the breakdown voltage by 260% than the conventional one. On comparing the proposed devices with the buried oxide double step devices, it has been found that an increase of ～15-19% in the breakdown voltage is observed in the proposed devices even at higher drift doping concentrations. The use of higher drift doping concentration reduces the on-resistance of the proposed device and thus improves the tradeoff between the breakdown voltage and the on-resistance of the proposed device in comparison to buried oxide double step devices. Further, the use of step doping in the collector drift region has resulted in the reduction of kink effect in the proposed device. Using the mixed mode simulations, the proposed devices have been tested at the circuit level, by designing and simulating inverting amplifiers employing the proposed devices. Both DC and AC analyses of the inverting amplifiers have shown that the proposed devices work well at the circuit level. It has been observed that there is a slight increase in ON delay in the proposed device; however, the OFF delay is more or less same as that of the conventional device.