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Modern comparative approach for carrier transport in InAlN/AlN superlattice device with characteristics and modelling using nitride (~(14)N, ~(15)N) isotopes

机译:InAlN / AlN超晶格器件中载流子传输的现代比较方法,具有使用氮化物(〜(14)N,〜(15)N)同位素进行特征化和建模的特性

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摘要

As we all know that, the performance and characteristics of any semiconductor device are effected by change in operating temperature. The temperature dependencies of the transport properties of InAlN/Al~(14)N~(15)N have been investigated using theoretical and mathematical study. Here we have considered the Al~(14)N~(15)N with different ratio of ~(14)N and ~(15)N for the analysis owing to considerable interest in superlattice structures of large band gap semiconductors having various favourable material properties such as very high thermal conductivity, high carrier mobility and wide bandwidth operation. This paper deals with analysis of temperature effect on some of the device modelling parameters like carrier mobility and scattering.
机译:众所周知,任何半导体器件的性能和特性都会受到工作温度变化的影响。利用理论和数学研究方法研究了InAlN / Al〜(14)N〜(15)N的传输性质与温度的关系。由于对具有各种有利材料的大带隙半导体的超晶格结构相当感兴趣,在这里我们考虑了具有不同比例的〜(14)N和〜(15)N的Al〜(14)N〜(15)N特性,例如非常高的热导率,高载流子迁移率和宽带宽操作。本文分析了温度对某些器件建模参数(如载流子迁移率和散射)的影响。

著录项

  • 来源
    《Superlattices and microstructures》 |2017年第3期|190-194|共5页
  • 作者单位

    Department of Electronics Engineering, Indian Institute of Technology (ISM), Dhanbad, 826004, India;

    Department of Electronics Engineering, Indian Institute of Technology (ISM), Dhanbad, 826004, India;

    Department of Electronics Engineering, Indian Institute of Technology (ISM), Dhanbad, 826004, India;

    Department of Electronics Engineering, Indian Institute of Technology (ISM), Dhanbad, 826004, India;

    Institute of Radio Physics and Electronics, University of Calcutta, 92, A.P.C. Road, Kolkata, 700009, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Scattering; Mobility;

    机译:散射;流动性;

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